李彦宏是中国人还是美国人呢?# Stock
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Company: Micron Technology
Location: Boise, Idaho
Note: The requirement for work experience could be relaxed for candidates
with solid optics background.
Job Title: R&D Reticle Enhancement Technology Engineer
As a Reticle Enhancement Technology (RET) Engineer at Micron, you will be
responsible for the design and execution of resolution enhancement
techniques and optical proximity correction (OPC) for different part types
within Micron R&D and production. You will be responsible for developing
process strategies for resolution enhancement techniques, including, but not
limited to: OPC, illumination optimization, scatter bar optimization and
application, phase shift lithography and custom illuminator design. The
scope of these responsibilities include development of current and future R&
D reticle strategies, as well as supporting relevant issues in production
with reticle solutions. RET engineers also must support the design and
layout groups with input on design rules to generate robust and
manufacturable designs for the process development and production groups.
Qualifications:
Successful candidates for this position will have:
• 3+ years experience in reticle development in the semiconductor
industry, preferably with direct input on data correction from design and
layout to improve printability of the process.
• Experience with photolithography simulation packages, such as
Solid-C, S-Litho, Prolith, etc.
• Experience with software packages developed by any EDA vendor (
Synopsys, Mentor Graphics, BRION, etc.), preferably in the areas of rule or
model based assist feature design, OPC empirical model creation and
lithography simulations.
• Strong knowledge in photolithography theory, including optics,
diffraction, phase shifting and resist modeling. Must have experience with
248 nm, 193 nm and 193 nm immersion lithography.
• Strong computer skills, including familiarity with Windows, Linux
, UNIX, and some experience with programming languages (Perl/C/C++/TCL/
Python).
• Knowledge of automation tools, layout and DRC tools like Cadence
DF2 and Hercules. (Preferred)
• Knowledge of semiconductor processing, the structure and function
of memory devices, emerging technology, and lithography.
• Strong communication, organizational, and presentation skills to
coordinate work across multiple groups.
• The ability to be highly motivated, goal oriented, and to
aggressively focus on solving problems both as part of a team and
individually.
• Excellent verbal and written communication skills to be effective
.
• Proven ability to manage projects effectively to meet deadlines
and work independently with minimal supervision.
Education:
M.S. or Ph.D. in engineering or relevant sciences (i.e., Physics, Optics,
etc.) is required.
[email protected]) if interested.
Company: Micron Technology
Location: Boise, Idaho
Note: The requirement for work experience could be relaxed for candidates
with solid optics background.
Job Title: R&D Reticle Enhancement Technology Engineer
As a Reticle Enhancement Technology (RET) Engineer at Micron, you will be
responsible for the design and execution of resolution enhancement
techniques and optical proximity correction (OPC) for different part types
within Micron R&D and production. You will be responsible for developing
process strategies for resolution enhancement techniques, including, but not
limited to: OPC, illumination optimization, scatter bar optimization and
application, phase shift lithography and custom illuminator design. The
scope of these responsibilities include development of current and future R&
D reticle strategies, as well as supporting relevant issues in production
with reticle solutions. RET engineers also must support the design and
layout groups with input on design rules to generate robust and
manufacturable designs for the process development and production groups.
Qualifications:
Successful candidates for this position will have:
• 3+ years experience in reticle development in the semiconductor
industry, preferably with direct input on data correction from design and
layout to improve printability of the process.
• Experience with photolithography simulation packages, such as
Solid-C, S-Litho, Prolith, etc.
• Experience with software packages developed by any EDA vendor (
Synopsys, Mentor Graphics, BRION, etc.), preferably in the areas of rule or
model based assist feature design, OPC empirical model creation and
lithography simulations.
• Strong knowledge in photolithography theory, including optics,
diffraction, phase shifting and resist modeling. Must have experience with
248 nm, 193 nm and 193 nm immersion lithography.
• Strong computer skills, including familiarity with Windows, Linux
, UNIX, and some experience with programming languages (Perl/C/C++/TCL/
Python).
• Knowledge of automation tools, layout and DRC tools like Cadence
DF2 and Hercules. (Preferred)
• Knowledge of semiconductor processing, the structure and function
of memory devices, emerging technology, and lithography.
• Strong communication, organizational, and presentation skills to
coordinate work across multiple groups.
• The ability to be highly motivated, goal oriented, and to
aggressively focus on solving problems both as part of a team and
individually.
• Excellent verbal and written communication skills to be effective
.
• Proven ability to manage projects effectively to meet deadlines
and work independently with minimal supervision.
Education:
M.S. or Ph.D. in engineering or relevant sciences (i.e., Physics, Optics,
etc.) is required.